Method for manufacturing MEMS device

专利名称：Method for manufacturing MEMS device发明人：Jianhong Mao,Deming Tang申请号：US13882337申请日：20110519公开号：US08841155B2公开日：20140923

专利附图：

摘要：A method for manufacturing a micro-electro-mechanical system (MEMS) deviceis provided. The method comprises: providing a semiconductor substrate, thesemiconductor substrate having a metal interconnection structure () formed therein;forming a first sacrificial layer () on the surface of the semiconductor substrate, the

material of the first sacrificial layer is amorphous carbon; etching the first sacrificial layerto form a first recess (); covering and forming a first dielectric layer () on the surface ofthe first sacrificial layer; thinning the first dielectric layer by a chemical mechanicalpolishing (CMP) process, until exposing the first sacrificial layer; forming a

micromechanical structure layer () on the surface of the first sacrificial layer and exposingthe first sacrificial layer, wherein a part of the micromechanical structure layer isconnected to the first dielectric layer. The method avoids polishing the amorphouscarbon, shortens the period of production, and improves the production efficiency.

申请人：Jianhong Mao,Deming Tang

地址：Shanghai CN,Shanghai CN

国籍：CN,CN

代理机构：Harness, Dickey & Pierce, P.L.C.

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