METHOD FOR MANUFACTURING MEMS DEVICE

专利名称：METHOD FOR MANUFACTURING MEMS

DEVICE

发明人：MAO, JIANHONG,TANG, DEMING申请号：EP11852932申请日：20110519公开号：EP2631939A4公开日：20141001

摘要：A method for manufacturing a micro-electro-mechanical system (MEMS) deviceis provided. The method comprises: providing a semiconductor substrate, the

semiconductor substrate having a metal interconnection structure (100) formed therein(S101); forming a first sacrificial layer (201) on the surface of the semiconductor substrate,the material of the first sacrificial layer is amorphous carbon (S102); etching the firstsacrificial layer to form a first recess (301) (S103); covering and forming a first dielectriclayer (401) on the surface of the first sacrificial layer (S104); thinning the first dielectriclayer by a chemical mechanical polishing (CMP) process, until exposing the first sacrificiallayer (S105); forming a micromechanical structure layer (500) on the surface of the firstsacrificial layer and exposing the first sacrificial layer (S106), wherein a part of themicromechanical structure layer is connected to the first dielectric layer. The methodavoids polishing the amorphous carbon, shortens the period of production, and improvesthe production efficiency.

申请人：LEXVU OPTO MICROELECTRONICS TECHNOLOGY (SHANGHAI)

更多信息请下载全文后查看